CVD Silicon Carbide (SiC)

CVD SILICON CARBIDE (SIC) OVERVIEW

Ortech offers cutting-edge CVD Silicon Carbide (SiC) chemical vapor deposition (CVD) processes, delivering top-quality silicon carbide with unparalleled properties. Our CVD silicon carbide (SiC) is engineered to withstand corrosive environments while retaining the exceptional strength, hardness, and wear resistance characteristic of silicon carbide. With a purity level of 99.9995%, our material enables semiconductor manufacturers to achieve ultra-clean production, enhancing efficiency and accelerating production cycles. The combination of excellent thermal, electrical and chemical properties makes CVD silicon carbide SiC well suited to many semiconductor,LED wafer carriers, Sputtering targets and optical applications.

SKU: CM10010 Category: Tag:

Description

CVD SIC FEATURES

  • Ultra-pure material – With a purity greater than
    99.9995% and no porosity
  • Extreme hardness and wear resistance
  • High thermal conductivity
  • High thermal shock resistance
  • Non-porous

ADVANCED FINISHING SERVICES

  • Precision grinding and lapping
  • Laser machining
  • Near-net shape capabilities
  • Engineering design and support
  • Precision motion components
  • Complex cleanroom assemblies

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